When measuring the spectral composition of a beam and its spatial intensity profile end-users face multiple potential problems. Currently, two separate technologies are needed to determine spectral and intensity profile characterization of the beam. The solution is provided by innovative equipment designed at ELI Beamlines, primarily intended for use in the field of VUV, XUV, soft X-ray and patented under an identification of EP3529572A1.
Having as much information as possible about the spectrum and intensity of a beam is crucial to all applications where quality, speed, and safety matter. Spectrum represents the distribution of the beam’s wavelengths or photon energies. Spectral measurement determines which wavelengths are present within the beam and quantifies their relative intensities. Spatial intensity profile describes the spatial distribution of the beam’s energy or brightness across its cross-section. It provides a two-dimensional representation of beam uniformity, illustrating whether the intensity is evenly distributed or exhibits variations such as central peaks or edge dimming.
Shortcomings of the current solutions
Current solutions for beam characterization in the XUV, VUV, soft X-ray range require multiple devices to separately measure the spectral composition of a beam, and its spatial intensity profile. This leads to many clearly defined problems. Specifically:
- High system cost: Two or more instruments (spectrometer + profiler) are needed.
- Complex alignment and calibration: Independent detectors must be precisely aligned; errors degrade data accuracy.
- Bulky setups: Conventional configurations take up lab/beamline space and aren’t easily portable or OEM-integrated.
- Time consuming measurements: Switching between spectrum and profile requires mechanical reconfiguration or separate runs.
- Data inconsistency: Two instruments require two data sources and therefore increase potential for misalignment and interpretation errors.
Two-in-one apparatus developed at ELI Beamlines
An integrated device for simultaneous spectral composition of a beam, and its spatial intensity profile presented is optimized for demanding spectral ranges VUV, XUV, and soft X-rays. The solution streamlines beam diagnostics by merging two traditionally separate systems, improving ease of use, reducing alignment complexity, and escaping the calibration mismatch between devices.
A device allows simultaneous or switchable characterization of a beam’s spectrum and intensity profile. Concept of one system – one detector – one optical path reduces hardware cost, complexity, and calibration effort. Compact and alignment-friendly design saves space, simplifies installation, and reduces downtime. Dual-mode functionality offers both spectral and spatial profiling without switching devices.
Potential market and end-users
We identified three clusters covering potential application environments where the described device can be deployed: production cleanrooms, e.g. EUV lithography toolchain, research beamlines and academic laboratories – University & institute photonics labs.
As far as end customers are concerned, we preferentially turn to laser physicists, beamline scientists, researchers in general, quality control technicians, metrology engineers, manufacturers, e.g. chip makers & their suppliers, etc.
Commercialization
This product is currently licensed to one company. If you are also interested in obtaining a license and/or would like to participate in the further development of the product, please do not hesitate to contact us.
Contact person:
Andrea Cejnarova, Innovation Manager
ELI ERIC – ELI Beamlines laser facility
+420 725 790 674
