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HIGH CONTRAST IMAGING FOR METROLOGY APPLICATIONS

We have developed a new method of characterization by light with increased sensitivity. It is based on multiple interaction of the probe beam with the object of interest. The object is self-imaged between the interactions to preserve the spatial information. Our method proved to increase sensitivity for the effect of the object on probe intensity, phase or polarization.

Features

  • Both reflection and transmission setups
  • Applicable to microscopy (imaging), interferometry, holography, profilometry, polarimetry/ellipsometry
  • Classical trade-off between spatial resolution and a field of view

Benefits

  • Simple optical setup, easy to align
  • Increases the effect of the object on the amplitude (intensity), phase and/or polarization of the probe
  • Two or four-fold increase in measurement sensitivity (SNR) using passive optical elements only
  • Applicable to both quantitative and qualitative methods

How does it work?

  • Multiple interactions of the probe with theobject employing object self-imaging.
  • The self-imaging system can consist of a lensand spherical mirror, or an afocal system oflenses and planar mirror.

Results

Four-pass interferometry setup implemented for low density gas-jet characterization. SNR increases with the number of passes.

We offer

Theoretical and experimental know-how and a license to our patent.

About us

ELI Beamlines is an international user facility that is involved in the development and operation of state-of-the-art laser systems, including some of the most powerful lasers in the world.Our in-house development of high power lasers has led to many new and unique engineering solutions for highly demanding applications where commercial solutions satisfying our stringent requirements did not exist.

 

Technology Transfer Office | tto@eli-beams.eu
Mr. Oskar Lazansky | e-mail: oskar. lazansky@eli-beams.eu  | mobile: +420 725 015 339

 

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